대한전자공학회:학술대회논문집 (Proceedings of the IEEK Conference)
- 대한전자공학회 2008년도 하계종합학술대회
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- Pages.933-934
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- 2008
자체 검사를 이용한 포토마스크 결점 추출
Self-Inspection for Photomask Defect Extraction
- Choi, Ji-Hee (Department of EEE POSTECH) ;
- Jeong, Hong (Department of EEE POSTECH)
- 발행 : 2008.06.18
초록
This paper describes the process of extracting defect from optical photomask images. We introduce a new method of finding photomask detects with a single optical photomask damaged image. The proposed algorithm is efficient when an original undamaged image is unavailable. The experiment showed that even a small and discontinuous photomask defect was extracted as well as continuous type of defects.
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