Silicidation Properties of Atomic Layer Deposited Nickel Film using by Rapid Thermal Process

  • Kim, Chang-Young (Department of Physics, Cheju National University) ;
  • Yun, Sang-Won (School of Electrical Engineering and Computer Science, Kyungpook National University) ;
  • Lee, Jung-Hee (School of Electrical Engineering and Computer Science, Kyungpook National University) ;
  • Choi, Chi-Kyu (Department of Physics, Cheju National University) ;
  • Lee, Kwang-Man (Faculty of Electrical and Electronic Engineering, Cheju National University)
  • Published : 2008.08.20