Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2008.08a
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- Pages.157-157
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- 2008
Silicidation Properties of Atomic Layer Deposited Nickel Film using by Rapid Thermal Process
- Kim, Chang-Young (Department of Physics, Cheju National University) ;
- Yun, Sang-Won (School of Electrical Engineering and Computer Science, Kyungpook National University) ;
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Lee, Jung-Hee
(School of Electrical Engineering and Computer Science, Kyungpook National University) ;
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Choi, Chi-Kyu
(Department of Physics, Cheju National University) ;
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Lee, Kwang-Man
(Faculty of Electrical and Electronic Engineering, Cheju National University)
- Published : 2008.08.20
Abstract
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