Direct Deposition of microcrystalline Si Films at Low Temperatures (<200 $^{\circ}C$) by Catalytic CVD

• Kim, Tae-Hwan (Dept. of Nano Science and Technology, University of Seoul) ;
• Lee, Kyung-Min (Dept. of Nano Science and Technology, University of Seoul) ;
• Won, Sung-Hwan (Dept. of Nano Science and Technology, University of Seoul) ;
• Sok, Jung-Hyun (Dept. of Nano Science and Technology, University of Seoul) ;
• Park, Kyoung-Wan (Dept. of Nano Science and Technology, University of Seoul) ;
• Hong, Wan-Shick (Dept. of Nano Science and Technology, University of Seoul)

• Published : 2008.02.14

• PDF