한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2008년도 제34회 동계학술대회 초록집
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- Pages.220-220
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- 2008
Measurement of electron temperature and density of the coaxial focused plasma in accordance with insulator lengths for extreme ultraviolet (EUV) lithography
- Hong, Young-June (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
- Moon, Min-Wug (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
- Kwon, Gi-Chung (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
- Seo, Yoon-Ho (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
- Cho, Guang-Sup (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
- Shin, Hee-Myoung (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
- Choi, Eun-Ha (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University)
- 발행 : 2008.02.14