Measurement of electron temperature and density of the coaxial focused plasma in accordance with insulator lengths for extreme ultraviolet (EUV) lithography

Hong, Young-June (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
Moon, Min-Wug (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
Kwon, Gi-Chung (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
Seo, Yoon-Ho (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
Cho, Guang-Sup (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
Shin, Hee-Myoung (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
Choi, Eun-Ha (Charged Particle Beam and Plasma Laboratory/PDP Research Center, Department of Electrophysics, Kwangwoon University)