Comparison of etching characteristics of ArF and EUV photoresists in dual-frequency superimposed capacitively coupled plasmas (DFS-CCP)

Kwon, B.S. (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Kim, H.W. (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Lee, H.J. (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Jung, H.Y. (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Lee, N.E. (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Lee, S.K. (Research & Development Division, Hynix Semiconductor)