한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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- Pages.247-248
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- 2008
$CH_4$ /Ar 플라즈마를 이용한 TiN 박막의 식각특성 연구
The etch characteristics of TiN thin films using in $CH_4$ /Ar plasma
- 우종창 (중앙대학교 전자전기공학부) ;
- 엄두승 (중앙대학교 전자전기공학부) ;
- 김관하 (중앙대학교 전자전기공학부) ;
- 김동표 (중앙대학교 전자전기공학부) ;
- 김창일 (중앙대학교 전자전기공학부)
- Woo, Jong-Chang (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Um, Doo-Seung (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Kim, Gwan-Ha (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Kim, Dong-Pyo (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Kim, Chang-Il (School of Electrical and Electronics Engineering, Chung-Ang University)
- 발행 : 2008.06.19
초록
The etching characteristics of Titanium Nitride (TiN) and etch selectivity of TiN to