한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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- Pages.194-194
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- 2008
열처리 효과에 따른 AZOB 투명 전도막의 특성
Influence of Annealing treatment on the properties of B doped ZnO:Al transparent conduction films
- 이종환 (정보통신공학부) ;
- 이규일 (정보통신공학부) ;
- 유현규 (정보통신공학부) ;
- 이태용 (정보통신공학부) ;
-
강현일
(정보통신공학부) ;
- 정규원 (한전 중앙교육원) ;
- 송준태 (성균관대학교)
- Lee, Jong-Hwan (Department of Information and Communication Engineering) ;
- Lee, Kyu-Il (Department of Information and Communication Engineering) ;
- Yu, Hyun-Kyu (Department of Information and Communication Engineering) ;
- Lee, Tae-Yong (Department of Information and Communication Engineering) ;
-
Kang, Hyun-Il
(Department of Information and Communication Engineering) ;
- Jeong, Kyu-Won (CEI of KEPCO (Central Education Institute of Korea Electric Power Company)) ;
- Song, Joon-Tae (SungKyunKwan Univ.)
- 발행 : 2008.06.19
초록
Boron doped ZnO:Al(AZOB) thin films were prepared on glass substrates by dc magnetron sputtering. Influence of the annealing treatment on the electrical and optical properties of AZOB thin films were investigated. The lowest resistivity of