투명 박막 트랜지스터 응용을 위한 RF Magnetron Sputtering으로 증착된 ZnO:Ga 박막의 특성

RF Magentron Sputtering deposited by ZnO:Ga thin film characterization for a transparent thin film transistor an application

  • 이석진 (충주대학교 전자공학과) ;
  • 권순일 (충주대학교 전자공학과) ;
  • 박승범 (충주대학교 전자공학과) ;
  • 정태환 (충주대학교 전자공학과) ;
  • 임동건 (충주대학교 전자공학과) ;
  • 박재환 (충주대학교 전자공학과) ;
  • 양계준 (충주대학교 전자공학과)
  • Lee, Seok-Jin (Department of Electronic Engineering, Chungju National University) ;
  • Kwon, Soon-Il (Department of Electronic Engineering, Chungju National University) ;
  • Park, Seung-Beum (Department of Electronic Engineering, Chungju National University) ;
  • Jung, Tae-Hwan (Department of Electronic Engineering, Chungju National University) ;
  • Lim, Dong-Gun (Department of Electronic Engineering, Chungju National University) ;
  • Park, Jea-Hwan (Department of Electronic Engineering, Chungju National University) ;
  • Yang, Kea-Joon (Department of Electronic Engineering, Chungju National University)
  • 발행 : 2008.11.06

초록

In this paper we report upon an investigation into the effect of sputter RF power on the electrical properties of Gallium doped zinc oxide (ZnO:Ga) film. Structural, electrical and optical properties of the ZnO:Ga films were investigation in terms of the sputtering power. Working pressure fixed in 5 mtorr and RF powers the variable did with 50~100 W. The result, We were able to without substrate temperature obtain resistivity of $9.3\times10^{-4}{\Omega}cm$ and optical transmittance of 90%.

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