한국정보디스플레이학회:학술대회논문집
- 2008.10a
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- Pages.258-260
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- 2008
Narrow Channel Formation Using Asymmetric Halftone Exposure with Conventional Photolithography
- Cheon, Ki-Cheol (LG Display, Process Development Team) ;
- Woo, Ju-Hyun (LG Display, Process Development Team) ;
- Jung, Deuk-Soo (LG Display, Process Development Team) ;
- Park, Mun-Gi (LG Display, Process Development Team) ;
- Kim, Hwan (LG Display, Process Development Team) ;
- Lim, Byoung-Ho (LG Display, Process Development Team) ;
- Yu, Sang-Jean (LG Display, Process Development Team)
- Published : 2008.10.13
Abstract
Developed halftone exposure technique was successfully applied to the fabrication of narrow transistor channels below