A study on control unit and system for nanoimprint equipment of the optimum conditions.

나노 임프린트 장비 최적 환경을 위한 제어 장비 및 시스템에 관한 연구

  • 박경서 (국민대학교 기계공학과 대학원) ;
  • 김우송 (국민대 기계공학과) ;
  • 임홍재 (국민대 기계자동차공학부) ;
  • 장시열 (국민대 기계자동차공학부) ;
  • 이기성 (국민대 기계자동차공학부) ;
  • 정재일 (국민대 기계자동차공학부) ;
  • 임시형 (국민대 기계자동차공학부) ;
  • 신동훈 (국민대 기계자동차공학부)
  • Published : 2008.11.05

Abstract

Controlling of thermal environment and flow in nanoimprint process chamber is important to ensure high precision levels of products. The purpose of this paper is to build optimal nanoimprint process environment. Because of this, Optimum PI control parameter for precise temperature control has been examined. Also porous medium of ventilation system is simulated for uniform flow in the equipment chamber. The porous medium consists of mesh structure, and is installed to place which flow the influx of the air flows. PID control parameter is based on the data obtained by experiment. And then heating and cooling method which simultaneously operated was used for decreasing an error. In conclude temperature in the equipment chamber was able to control precisely in the range of ${\pm}0.1^{\circ}C$ by the PID control parameter and Deadband.

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