UV nano imprint 공정에서 air bubble area 최소화에 대한 연구

Experimental study to minimize the air bubble during the imprinting process in UV nanoimprint lithography

Formation of air bubble is the one of common defects in UV nano imprint lithography. Location of dispensing and volume of droplets are among the most important parameters in the process. ]n this study, UV curable resin droplets with different volumes were dispensed at different locations and pressed to investigate air bubble formation. By varying volume of droplet and dispensing location, process conditions were found for minimum air bubble area.