Thickness effect of a Ge interlayer on the formation of nickel silicides

• Choe, Cheol-Jong (IT Convergence Technology Research Division, Electronics and Telecommunications Research Institute (ETRI)) ;
• Jang, Seo-Yong (Materials Engineering Group, Korea Electric Power Research Institute (KEPRI)) ;
• Lee, Seong-Jae (Department of Physics, Hanyang University) ;
• Ok, Yeong-U (Department of Materials Science and Engineering, Korea University) ;
• Seong, Tae-Yeon (Department of Materials Science and Engineering, Korea University)

• 최철종 ;
• 장서용 ;
• 이성재 ;
• 옥영우 ;
• 성태연

• Published : 2007.05.31

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