Anti-Corrosive Mechanism of Mg Thin Films Prepared by PVD Method on Electroplated Zn Steel Substrates

PVD법에 의해 Zn 전기도금강판에 제작한 Mg막의 내식 메카니즘

  • 백상민 (한국해양대학교 기관시스템공학부) ;
  • 배일용 (한국해양대학교 기관시스템공학부) ;
  • 문경만 (한국해양대학교 기계소재공학부) ;
  • 김기준 (한국해양대학교 기관시스템공학부) ;
  • 이명훈 (한국해양대학교 기관시스템공학부)
  • Published : 2007.04.05

Abstract

Mg thin films were prepared by PVD method on electroplated Zn steel substrate. And the influence of gas pressure on their morphology and crystal orientation of the deposited films were investigated by scannig electron microscopy(SEM) and X-ray diffraction(XRD), respectively. In addition, the effect of corrosion resistance of these films as a funtion of morphology and crystal orientation was evaluated by anodic polarization test. From the measured results, it is investigated that the film of granular structure which deposited in condition of high gas pressure had the highest corrosion resistance.

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