한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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- Pages.106-107
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- 2007
나노 광소자 응용을 위한 알루미늄 양극산화박막 공정
Thin film process of anodic aluminum oxidation for optoelectronic nano-devices
- Choi, Jae-Ho (Chonbuk National University) ;
- Baek, Ha-Bong (Chonbuk National University) ;
- Kim, Keun-Joo (Chonbuk National University)
- 발행 : 2007.06.21
초록
We fabricated anodic aluminium oxides (AAO) on Si and sapphire substrates from the electrochemical reactions of thin AI films in an aqueous solution of oxalic acid. The thin AI films have deposited on Si and Sapphire substructure by using E-beam evaporation and thermal evaporation, respectively. The formation of AAO structures has investigated from FE-SEM measurement image and showed randomly distributed phase of nanoholes instead of the periodic lattice of photonic crystals. The AAO structure on sapphire shows the double layers of nanoholes.