한국정보디스플레이학회:학술대회논문집
- 2007.08a
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- Pages.534-537
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- 2007
Advanced Nanoimprinting Material for Liquid Crystal Alignment
- Gwag, Jin-Seog (Liquid Crystal Nano-System Project, ERATO-SORST, Japan Science and Technology Agency) ;
- Oh-e, Masahito (Liquid Crystal Nano-System Project, ERATO-SORST, Japan Science and Technology Agency) ;
- Yoneya, Makoto (Liquid Crystal Nano-System Project, ERATO-SORST, Japan Science and Technology Agency, Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology) ;
- Yokoyama, Hiroshi (Liquid Crystal Nano-System Project, ERATO-SORST, Japan Science and Technology Agency, Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology) ;
- Satou, H. (CHISSO PETROCHEMICAL CORPORATION, GOI RESEARCH CENTER RESEARCH LABORATORY) ;
- Itami, S. (CHISSO PETROCHEMICAL CORPORATION, GOI RESEARCH CENTER RESEARCH LABORATORY)
- Published : 2007.08.27
Abstract
To promote liquid crystal application of nanoimprint lithography, a polymer with new concept is proposed. The material consists of a polyamic acid for good LC alignment and an epoxy resin for good imprinting. The result of sum-frequency generation (SFG) vibrational spectroscopy proves that this material is a functionally gradient material. This material shows excellent capability as a nanoimprinting material as well as an LC alignment layer.