대한기계학회:학술대회논문집 (Proceedings of the KSME Conference)
- 대한기계학회 2007년도 춘계학술대회B
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- Pages.3168-3172
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- 2007
반도체 세정 공정 평가를 위한 나노입자 안착 시스템 개발
Development of Particle Deposition System for Cleaning Process Evaluation in Semiconductor Fabrication
- 발행 : 2007.05.30
초록
As the minimum feature size decreases, control of contamination by nanoparticles is getting more attention in semiconductor process. Cleaning technology which removes nanoparticles is essential to increase yield. A reference wafer on which particles with known size and number are deposited is needed to evaluate the cleaning process. We simulated particle trajectories in the chamber by using FLUENT and designed a particle deposition system which consists of scanning mobility particle sizer (SMPS) and deposition chamber. Charged monodisperse particles are generated using SMPS and deposited on the wafer by electrostatic force. The experimental results agreed with the simulation results well in terms of particle number and deposition area according to particle size, flow rate and deposition voltage.