Strong 380 nm ultraviolet photoluminescence from SiOx (x<2) film prepared by PECVD

  • Lee, Sol (Department of Nano Science and Technology, University of Seoul) ;
  • Park, Byoung-Youl (Department of Nano Science and Technology, University of Seoul) ;
  • Park, Kyoung-Wan (Department of Nano Science and Technology, University of Seoul) ;
  • Han, Moon-Sup (Department of Physics, University of Seoul)
  • Published : 2007.02.06