한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2007년도 추계학술대회 논문집
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- Pages.365-366
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- 2007
고효율 마그네트론 스퍼트링 캐소드의 설계 및 박막 제작 특성
Thin films made by magnetron sputtering cathode with wide target erosion
- 발행 : 2007.11.01
초록
High quality cathode with high deposition rate of thin films and long target life time is required for manufacturing TFT-LCD and semiconductor. We developed WV(wide view) sputtering cathode with wide erosion area and high deposition rate. Ti thin film thickness variation in WV cathode is below 5% for 380 kWh target life time. Al thin film thickness using normal cathode is decreased about 20%. By using WV cathode, target using efficiency was improved 40%. in comparison with normal cathode.