한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2007년도 추계학술대회 논문집
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- Pages.214-215
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- 2007
Investigation of phenol phormaldehyde-based photoresist at an initial stage of destruction in $O_2$ and $N_2O$ radiofrequency discharges
- Shutov, D.A. (Dept. of Electronic Devices & Materials Technology, Ivanovo State University of Chemistry & Technology) ;
- Kang, Seung-Youl (IT Convergence & Components Laboratory, ETRI) ;
- Baek, Kyu-Ha (IT Convergence & Components Laboratory, ETRI) ;
- Suh, Kyung-Soo (IT Convergence & Components Laboratory, ETRI) ;
- Min, Nam-Ki (Dept. of Control and Instrumentation Engineering, Korea University) ;
- Kwon, Kwang-Ho (Dept. of Control and Instrumentation Engineering, Korea University)
- 발행 : 2007.11.01
초록
Etch rates and surface chemistry of phenol formaldehyde-based photoresist after short time