대한전자공학회:학술대회논문집 (Proceedings of the IEEK Conference)
- 대한전자공학회 2006년도 하계종합학술대회
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- Pages.985-986
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- 2006
PLD를 사용하여 Ti doped K(Ta,Nb)O3 thin film의 유전특성을 위한 annealing 효과
The effect of annealing for dielectric properties of Ti doped $K(Ta,Nb)O_3$ thin film using PLD
- Koo, Ja-Yl (Department of Digital Electronics Information, Inha technical college) ;
- Yi, Chong-Ho (Department of Digital Electronics Information, Inha technical college) ;
- Bae, Hyung-Jin (Department of Materials Science and Engineering, University of Florida) ;
- Lee, Won-Suk (Department of School of Electronics Engineering, Dongyang technical College)
- 발행 : 2006.06.21
초록
The epitaxial
키워드