Electrical properties of $HfO_xN_y$ thin films deposited by PECVD

  • Park J.H. (Department of Chemistry and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
  • Hyun J.S. (Department of Chemistry and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
  • Kang B.C. (Department of Chemistry and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
  • Boo J.H. (Department of Chemistry and Center for Advanced Plasma Surface Technology, Sungkyunkwan University)
  • Published : 2006.02.01