고분자 기판상에 제작된 ITO 박막의 특성 연구

The ITO thin films were prepared by FTS (Facing Targets Sputtering) system on polycarbonate (PC) substrate. The ITO thin films were deposited with a film thickness of 100nm at room temperature. As a function of sputtering conditions, electrical and optical properties of prepared ITO thin films were measured. The electrical and optical characteristics of the ITO thin films were evaluated by Hall Effect Measurement (EGK) and UV-VIS spectrometer (HP), respectively. From the results, the ITO thin film was deposited with a resistivity $8{\times}10^{-4}[{\Omega}-cm]$ and transmittance over 80%.