한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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- Pages.444-445
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- 2006
공정변수에 의한 flexible 기판상의 ZnO:Al 박막의 제작
Preparation of ZnO:Al thin film on flexible substrate by process variable
- Cho, Bum-Jin (Kyungwon University) ;
- Keum, Min-Jong (Kyungwon University) ;
- Son, In-Hwan (Shinsung College) ;
- Choi, Dong-Jin (Kyungwon University) ;
- Kim, Kyung-Hwan (Kyungwon University)
- 발행 : 2006.06.22
초록
We prepared ZnO:Al thin films under various sputtering conditions by using facing targets sputtering (FTS) method. ZnO:Al thin films were deposited on polyethersulfon (PES) substrate which is the thickness of 200um at room temperature. the electrical, optical and crystallographic properties of ZnO:Al were investigated. From the results, prepared alll ZnO:Al thin films showed (002) diffraction peaks. ZnO:Al thin film with a resistivity of