한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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기판의 종류에 따라 제작한 ITO 박막의 특성

Characteristics of ITO thin films on different substrates

  • 발행 : 2006.11.09
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초록

We prepared ITO thin films using Facing Targets Sputtering(FTS) method with various input currents at room temperature on Polycarbonate(PC) and Polyethersulfon(PES) substrates. As a function of sputtering conditions, electrical and optical properties of prepared ITO thin films were measured. The electrical, optical, structural characteristics of ITO thin films were evaluated by Hall Effect Measurement(EGK), X-Ray Diffractormeter(Rigaku) and UV-VIS spectrometer(HP) respectively. From the results, we obtained ITO thin films that have a resistivity of $4{\times}10^{-4}[{\Omega}-cm]$ on PC and $527{\times}10^{-4}[{\Omega}-cm]$ on PES. Also, the optical transmittances of all samples were over 80%.

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