한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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- Pages.19-20
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- 2006
다결정 실리콘 웨이퍼의 표면 텍스쳐링을 위한 습식 화학 식각에 대한 연구
Investigation of Wet Chemical Etching for Surface Texturing of Multi-crystalline Silicon Wafers
- Kim, Bum-Ho (Dept of Electronic Engineering, Sejong Univ.) ;
- Lee, Hyun-Woo (Dept of Electronic Engineering, Sejong Univ.) ;
- Lee, Eun-Joo (Dept of Electronic Engineering, Sejong Univ.) ;
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Lee, Soo-Hong
(Dept of Electronic Engineering, Sejong Univ.)
- 발행 : 2010.04.01
초록
Two methods that can reduce reflectance in solar cells are surface texturing and anti-reflection coating. Wet chemical etching is a typical method that surface texturing of multi-crystalline silicon. Wet chemical etching methods are the acid texturization of saw damage on the surface of multi-crystalline silicon or double-step chemical etching after KOH saw damage removal too. These methods of surface texturing are realized by chemical etching in acid solutions HF-