한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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- Pages.1645-1648
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- 2006
A five mask CMOS LTPS process with LDD and only one ion implantation step
- Schalberger, Patrick (Chair of Display Technology, University of Stuttgart) ;
- Persidis, Efstathios (Chair of Display Technology, University of Stuttgart) ;
- Fruehauf, Norbert (Chair of Display Technology, University of Stuttgart)
- 발행 : 2006.08.22
초록
We have developed a CMOS LTPS process, which requires only five photolithographic masks and only one ion doping step. Single TFTs, inverters, ring oscillators and shift registers were fabricated. N- and p-channel devices reached field effect mobilities of
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