한국정보디스플레이학회:학술대회논문집
- 2006.08a
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- Pages.826-829
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- 2006
A High Aperture Mobile in the FFS TFT-LCD by the using Fine Patterning Process
- Yun, Hee-Jung (SBU Development Center, BOE HYDIS) ;
- Lim, Yun-Sik (SBU Development Center, BOE HYDIS) ;
- Choi, Seung-Jin (SBU Development Center, BOE HYDIS) ;
- Bin, Jin-Ho (SBU Development Center, BOE HYDIS) ;
- Park, Jong-Kyun (SBU Development Center, BOE HYDIS) ;
- Park, Min-Hwan (SBU Development Center, BOE HYDIS) ;
- Lee, Yan-Ho (SBU Development Center, BOE HYDIS) ;
- Ihm, Sam-Ho (SBU Development Center, BOE HYDIS) ;
- Lim, Young-Jin (SBU Development Center, BOE HYDIS)
- Published : 2006.08.22
Abstract
In order to increase the transmittance of panel, in process of FFS TFT-LCD, fine patterning process which is adopted to the optimum passivation(PVX) hole was applied fine metal line patterning process and was made with optimum efficiency of liquid crystal by using space/bar size control of pixel electrode. We fabricated 2.03" mobile FFS devices with fine patterning process. Further, this technology will be applied to the basis of other process for higher PPI or higher aperture ratio technology.
Keywords