대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)

대한전기학회 (The Korean Institute of Electrical Engineers)
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AC PDP의 MgO 결정방향성과 증착조건간의 상관관계에 관한 연구

The relationships between the MgO crystal orientation and the conditions of deposition on AC-PDP

  • Jang, Jin-Ho (Department of Electrical Engineering, Pusan National University) ;
  • Jang, Yong-Min (Department of Electrical Engineering, Pusan National University) ;
  • Lee, Ji-Hoon (Department of Electrical Engineering, Pusan National University) ;
  • Cho, Sung-Yong (Department of Electrical Engineering, Pusan National University) ;
  • Kim, Dong-Hyun (Department of Electrical Engineering, Pusan National University) ;
  • Park, Chung-Hoo (Department of Electrical Engineering, Pusan National University)
  • 발행 : 2006.10.27
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초록

In the AC PDP, the MgO film is used as electrode protective film. This film must provide excellent ion bombardment protection, high secondary electron emission, and should be high transparent to visible radiation. In this study, we investigated the relations between the crystal orientation and e-beam evaporation process parameters. The crystal orientation of the MgO layer depends on the conditions of deposition. The parameters are the thickness of the MgO film $1000{\AA}-6500{\AA}$, the deposition rate $200{\AA}/min{\sim}440{\AA}/min$, the temperature $150^{\circ}C{\sim}250^{\circ}C$, and the distance between crucible and substrate 11cm ${\sim}$ 14cm. The temperature of substrate and evaporation rate of source material, or deposition rate of the film, are definitely related to the crystal orientation of the MgO thin film. The crystal orientation can be changed by the distance between the target(MgO tablet) and the substrate. However, the crystal orientation is not much affected by the thickness of MgO thin film.

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