광역평탄화에 따른 투명전도박막의 표면특성

Surface Properties of ITO Thin Film by Planarization

  • 최권우 (조선대학교 전기공학과) ;
  • 이우선 (조선대학교 전기공학과) ;
  • 서용진 (대불대학교 전기전자공학부)
  • 발행 : 2006.10.27

초록

ITO thin film is generally fabricated by various methods such as spray, CVD, evaporation, electron gun deposition, direct current electroplating, high frequency sputtering, and reactive DC sputtering. However, some problems such as peaks, bumps, large particles, and pin-holes on the surface of ITO thin film were reported, which caused the destruction of color quality, the reduction of device life time, and short-circuit. Chemical mechanical polishing (CMP) process is one of the suitable solutions which could solve the problems.

키워드