1mm의 채널을 갖는 ZnO 투명 박막 트랜지스터

Transparent ZnO thin film transistor with long channel length of 1mm

  • 이충희 (연세대학교 전기전자공학과) ;
  • 안병두 (연세대학교 전기전자공학과) ;
  • 오상훈 (연세대학교 전기전자공학과) ;
  • 김건희 (연세대학교 전기전자공학과) ;
  • 이상렬 (연세대학교 전기전자공학과)
  • Lee, Choong-Hee (Department of Electrical and Electronic Engineering, Yonsei University) ;
  • Ahn, Byung-Du (Department of Electrical and Electronic Engineering, Yonsei University) ;
  • Oh, Sang-Hoon (Department of Electrical and Electronic Engineering, Yonsei University) ;
  • Kim, Gun-Hee (Department of Electrical and Electronic Engineering, Yonsei University) ;
  • Lee, Sang-Yeol (Department of Electrical and Electronic Engineering, Yonsei University)
  • 발행 : 2006.10.27

초록

Transparent ZnO thin film transistor (TFT) is fabricated on the glass substrates. The device consists of a high mobility intrinsic ZnO as a semiconductor active channel, Ga doped ZnO (GZO) as an electrode, $HfO_2$ as a gate insulator. GZO and $HfO_2$ layers are prepared by using a pulsed laser deposition and intrinsic ZnO layers are fabricated by using an rf-magnetron sputtering, respectively. The transparent TFT is highly transparent (> 87 %) and exhibits n-channel, enhancement mode behavior with a field-effect mobility as large as $11.7\;cm^2/Vs$ and a drain current on-to-off ratio of about $10^5$.

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