Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2006.04a
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- Pages.96-98
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- 2006
Plasma Diagnosis by Using Scanning Electron Microscope and Neural Network
신경망과 주사전자현미경을 이용한 플라즈마 진단
Abstract
A new ex-situ model to diagnose a plasma processing equipment was presented. The model was constructed by combining wavelet, scanning electron microscope, ex-situ measurement of etching profile, and neural network. The diagnosis technique was applied to a tungsten etching process, conducted in a