Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2005.07a
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- Pages.430-431
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- 2005
Characteristics of ITO thin films with sputtering conditions
스퍼터링 조건 변화에 따라 제작된 ITO 박막의 특성
- Kim, K.H. (Kyungwon Univ.) ;
- Kim, H.W. (Kyungwon Univ.) ;
- Kong, S.H. (S.A.I.T) ;
- Keum, M.J. (Kyungwon Univ.) ;
- Shin, S.K. (Donghae Univ.)
- Published : 2005.07.07
Abstract
In this work, the ITO thin films were prepared by FTS (Facing Targets Sputtering) system under different sputtering conditions which were varying