Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Fabrication of c-axis Oriented $LiNbO_3$ Thin Film by PLD

C축으로 배향된 $LiNbO_3$ 박막의 PLD 증착 조건 연구

  • 김현준 (한국과학기술연구원(KIST) 박막재료연구센터) ;
  • 김달영 (한국과학기술연구원(KIST) 박막재료연구센터) ;
  • 김상종 (한국과학기술연구원(KIST) 박막재료연구센터) ;
  • 강종윤 (한국과학기술연구원(KIST) 박막재료연구센터) ;
  • 성만영 (고려대학교 전기공학과) ;
  • 윤석진 (한국과학기술연구원(KIST) 박막재료연구센터) ;
  • 김현재 (한국과학기술연구원(KIST) 박막재료연구센터)
  • Published : 2005.07.07
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Abstract

Ferroelectric Lithium niobate ($LiNbO_3$) thin films are fabricated on $Al_2O_3$(0001) substrate using Pulsed Laser Deposition (PLD). The various deposition conditions such as substrate temperature, oxygen pressure, and post annealing condition are investigated to deposite c-axis oriented $LiNbO_3$ thin films. Highly c-axis oriented thin films are obtained under the conditions of working pressure of 100 mTorr, deposition for 10 min at $450^{\circ}C$, and in-situ annealing for 40 min. The $LiNbO_3$ thin films are chemically etched after electric poling and the etched configurations are studied by scanning electron microscope (SEM).

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