Effects of thickness on the properties of ITO films deposited by a low-frequency magnetron sputtering

  • Lee, Sung-Ho (Gumi Institute of Electronics Technology) ;
  • Jung, Sang-Kooun (Department of Physics, Kyungpook National University) ;
  • Hur, Young-June (Advanced Display Manufacturing Research Center, Kyungpook National University) ;
  • Lee, Do-Kyung (Gumi Institute of Electronics Technology) ;
  • Park, Duck-Kyu (Department of Physics, Kyungpook National University) ;
  • Park, Lee-Soon (Department of Polymer Science, Kyungpook National University) ;
  • Sohn, Sang-Ho (Department of Physics, Kyungpook National University)
  • 발행 : 2005.07.19

초록

Indium-tin oxide (ITO) films were deposited by a low-frequency (LF, 100 Hz) magnetron sputtering on glass substrates at the room temperature. The effects of the film thickness on the structural, electrical and optical properties of ITO films were investigated. With the film thickness the films reveal better crystallinity, showing both (222) and (400) pla nes in the XRD pattern. The optical transmittance and the sheet resistance of the films decreased with the increasing thickness. In addition, the electrical properties of ITO films were improved after annealing in a vacuum.

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