한국정보디스플레이학회:학술대회논문집
- 2005.07b
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- Pages.1477-1479
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- 2005
Preparation of ITO Thin Films for Display Application with $O_2$ Gas Flow Ratio and Input Current by FTS (Facing Targets Sputtering) System
- Kim, H.W. (Kyungwon Univ. Dept. of Electrical & Information Engineering) ;
- Keum, M.J. (Kyungwon Univ. Dept. of Electrical & Information Engineering) ;
- Lee, K.S. (SAMSUNG SDI Co.,LTD) ;
- Kim, H.K. (SAMSUNG SDI Co.,LTD) ;
- Kim, K.H. (Kyungwon Univ. Dept. of Electrical & Information Engineering)
- Published : 2005.07.19
Abstract
In this work, the ITO thin films were prepared by FTS (Facing Targets Sputtering) system under different sputtering conditions which were varying
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