Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)
- 2005.10a
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- Pages.593-597
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- 2005
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- 2005-8446(pISSN)
The Analysis of Chemical Vapor Deposition Characteristics using Focused Ion Beam
FIB-CVD의 가공 공정 특성 분석
Abstract
FIB equipment can perform sputtering and chemical vapor deposition simultaneously. It is very advantageously used to fabricate a micro structure part having 3D shape because the minimum beam size of
Keywords
- FIB(focused Ion Beam);
- Nano Patterning technology;
- FIB-CVD;
- Chemical Vapor Deposition;
- Taguchi Analysis
- 나노패턴;
- 집속이온빔 화학적증착;
- 화학증착;
- 다구찌 분석;