Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)
- 2005.10a
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- Pages.498-501
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- 2005
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- 2005-8446(pISSN)
Nano imprinting lithography fabrication for photonic crystal waveguides
나노 임프린트 공정에 의한 광자결정 도파로 제조공정
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Jung Une-Teak
(Nano Science. Dept. PNU) ;
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Kim Chang-Soek
(Nano Engineering Dept. PNU) ;
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Jeong Myung-Yung
(Nano Engineering Dept. PNU)
- Published : 2005.10.01
Abstract
Photonic crystals, periodic structure with a high refractive index contrast modulation, have recently become very interesting platform for manipulation of light. The existence of a photonic bandgap, a frequency range in which propagation of light is prevented in all direction, makes photonic crystal very useful in application where spatial localization of light is required for waveguide, beam splitter, and cavity. But fabrication of 3 dimensional photonic crystal is still difficult process. a concept that has recently attracted a lot of attention is a planar photonic crystal based on a dielectric membrane, suspended in the air, and perforated with 2 dimensional lattice of hole. We show that the polymer slabs suspended in air with triangular lattice of air hole can exhibit the in-plane photonic bandgap for TE-like modes. The fabrication of Si master with pillar structure using hot embossing process was investigated for 2 dimensional low-index-contrast photonic crystal waveguide.
Keywords