Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지

CMP Properties of ITO Thin Film with a Control of Temperature in Pad Conditioning Process

패드 컨디셔닝 온도 변화가 ITO 박막 연마특성에 미치는 영향

  • 최권우 (조선대학교 전기공학과) ;
  • 김남훈 (조선대학교 에너지자원신기술연구소) ;
  • 서용진 (대불대학교 전기공학과) ;
  • 이우선 (조선대학교 전기공학과)
  • Published : 2005.11.10
Download PDF
⟨ Previous Next ⟩

Abstract

The material that is both conductive in electricity and transparent to the visible ray is called transparent conducting thin film. It is investigated the performance of ITO-CMP process using commercial silica slurry with the various conditioning temperatures by control of de-ionized water (DIW). Removal rate of ITO thin film was improved after CMP process after pad conditioning at the high temperature by improved exclusion of slurry residues in polishing pad..

Keywords