자계 분포 변화에 따른 OLED용 Al 박막의 제작

Preparation of Al Thin Film with Magnetic Field Distribution

  • 김현웅 (경원대학교 전기공학과) ;
  • 조범진 (경원대학교 전기공학과) ;
  • 금민종 (경원대학교 전기공학과) ;
  • 김경환 (경원대학교 전기공학과)
  • 발행 : 2005.11.04

초록

The Al electrode for OLED was prepared by Facing Targets Sputtering(FTS) system which can reduce the damage of organic layer. The Al thin films were deposited on the cell (Lif/EML/HTL/Bottom electrode : ITO) for examination the current-voltage properties of OLED with magnetic field distribution between two faced targets. Thickness and current-voltage properties of Al thin films are measured by ${\alpha}-step$ and semiconductor parameter analyzer (HP4156A), respectively.

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