대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 2005년도 추계학술대회 논문집 전기물성,응용부문
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- Pages.12-14
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- 2005
극저온($150^{\circ}C$ )에서 ICP-CVD로 증착한 Nanocrystalline-Si 박막
Nanocrystalline-Si Thin Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition (ICP-CVD) at $150^{\circ}C$
- Park, Snag-Geun (School of Electrical Engineering, Seoul National University) ;
- Han, Sang-Myeon (School of Electrical Engineering, Seoul National University) ;
- Shin, Kwang-Sub (School of Electrical Engineering, Seoul National University) ;
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Han, Min-Koo
(School of Electrical Engineering, Seoul National University)
- 발행 : 2005.11.04
초록
Inductively Coupled Plasma Chemical Vapor Deposition(ICP-CVD)를 이용하여 공정온도
키워드