대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 2005년도 심포지엄 논문집 정보 및 제어부문
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- Pages.281-283
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- 2005
웨이브릿과 X-ray 광전자 분광법을 이용한 반도체 플라즈마 공정 감시 기법
Monitoring of semiconductor plasma process using wavelet and X-ray photoelectron spectroscopy
초록
Processing Plasmas are very sensitive to a variation in process parameters, To maintain process quality and device field, plasma malfunction should be tightly monitored with high sensitivity. A new monitoring method is presented and this was accomplished by applying discrete wavelet transformation to X-ray photoelectron spectroscopy. XPS data were collected during a plasma etching of silicon carbide. Various effects of DWT factor on fault sensitivity were optimized experimentally. Compared to raw data, total percent sensitivity for DWT data demonstrated a significantly improved sensitivity to plasma faults induced by bias power.