Micro channel forming of ultra thin copper foil

초미세 구리 박판의 마이크로 채널 성형

  • 주병윤 (서울대학교 기계항공공학부) ;
  • 임성한 (한국기술교육대학교 기계정보공학부) ;
  • 오수익 (서울대학교 기계항공공학부) ;
  • 백승욱 (서울대학교 기계항공공학부)
  • Published : 2005.09.01

Abstract

The objective of this research was to establish the size limitation of micro metal forming and analyze the formability of foil. Flat-rolled ultra thin metallic copper foil($3{\mu}m$ in thickness) was used as a forming material and foil was annealed to improve the formability at the temperature of $385^{\circ}C$. Forming die was fabricated by using etching technique of DRIE(deep reactive ion etching) and HNA isotropic etching. For the forming die and coupe. foil were vacuum packed and the forming was conducted as applying hydrostatic pressure of 250MPa to the vacuum packed unit. We successfully obtained the micro channels of $12\~14{\mu}m$ width and $9{\mu}m$ depth from micro forming process we designed. We also investigated the thickness strain distribution of foil from experiment and FE simulation result. Micro channels had a good formability of smooth surface and size accuracy. We expect that micro metal forming technology will be applied to production of micro parts.

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