대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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- Pages.2172-2174
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- 2005
E-beam과 R.F. 마그네트론 스퍼터링을 사용한 double MgO박막의 전기-광학적 특성
Electro - Optical Characteristics of MgO Double Layer prepared by E-beam and Sputtering Method
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옥정우
(부산대학교 전기공학과) ;
- 김현종 (부산대학교 전기공학과) ;
- 최정훈 (부산대학교 전기공학과) ;
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최준영
(부산대학교 전기공학과) ;
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김동현
(부산대학교 전기공학과) ;
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이해준
(부산대학교 전기공학과) ;
- 유수복 (울산과학대학교 전기전자통신공학부) ;
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박정후
(부산대학교 전기공학과)
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Ok, J.W.
(Dep. of Electrical Engineering, Pusan National University) ;
- Kim, H.J. (Dep. of Electrical Engineering, Pusan National University) ;
- Choi, J.H. (Dep. of Electrical Engineering, Pusan National University) ;
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Choi, J.Y.
(Dep. of Electrical Engineering, Pusan National University) ;
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Kim, D.H.
(Dep. of Electrical Engineering, Pusan National University) ;
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Lee, H.J.
(Dep. of Electrical Engineering, Pusan National University) ;
- Yoo, S.B. (Dep. Of Electrical Engineering, Ulsan College) ;
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Park, J.H.
(Dep. of Electrical Engineering, Pusan National University)
- 발행 : 2005.07.18
초록
MgO has been used as the material of the protecting layer for AC PDP. AC PDP is influenced by characteristics of the surface glow discharge on the MgO thin film. Because MgO thin film is practically discharge electrodes, the discharge characteristics of MgO thin film should be varied with the method of deposition. In this study, changing order and time of deposition, we use electron beam evaporation system and R.F reactive magnetron sputtering system in the MgO deposition. Particularly, after using electron beam evaporation system, we use R.F. reactive magnetron sputtering system in the MgO deposition, then we could get lower amount of charge and higher luminance efficiency than only using electron beam evaporation system.
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