Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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Micro structural characteristics of Bragg reflector of SMR type FBAR device deposited by RF magnetron sputtering

RF 마그네트론 스퍼터링에 의해 증착된 SMR 구조 FBAR 소자의 Bragg 반사층의 미세구조 특성에 관한 연구

  • Park, Sung-Hyun (Department of Electric and Electronics Engineering in Kyungwon University) ;
  • Lee, Sun-Beom (Department of Electric and Electronics Engineering in Kyungwon University) ;
  • Lee, Neung-Heon (Department of Electric and Electronics Engineering in Kyungwon University) ;
  • Shin, Young-Hwa (Department of Electric and Electronics Engineering in Kyungwon University)
  • 박성현 (경원대학교 전기전자공학과) ;
  • 이순범 (경원대학교 전기전자공학과) ;
  • 이능헌 (경원대학교 전기전자공학과) ;
  • 신영화 (경원대학교 전기전자공학과)
  • Published : 2005.07.18
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Abstract

In this study, Bragg reflector was formed as tungsten(W) and $SiO_2$ deposited by RF magnetron sputtering according to variable conditions of RF power and working pressure to apply to the SMR type FBAR device, one of the next generation mobile communication devices. The micro-structural properties such as a crystal orientation, roughness and micro- structure were measured by XRD, AFM and SEM and the best condition of Bragg reflector was elicited with analyzing that results of the thin films about each conditions. Finally, FBAR device was fabricated with applying the Bragg reflector was formed on the best condition and measured the resonance properties and compared other research and considered it.

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