MOCVD and Characterization of ZnO Thin Films Using an Aminoalkoxide Single Precursor

  • Kim, Ju-Yeon (Thin Films Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
  • Kim, Min-Chan (Thin Films Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
  • Lee, Young-Kuk (Thin Films Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
  • Chung, Taek-Mo (Thin Films Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology) ;
  • Kim, Chang-Gyoun ;
  • Kim, Yun-Soo (Thin Films Materials Laboratory, Advanced Materials Division, Korea Research Institute of Chemical Technology)
  • Published : 2004.08.19