Silicon nitride cleaning by $F_2$/Ar remote plasma processing

  • Hwang, J.Y. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
  • Kang, S.C. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
  • Lee, N.E. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
  • Joo, K.S. (Atto, Shinhwa Indus. Com.) ;
  • Bae, G. (Atto, Shinhwa Indus. Com.)
  • Published : 2004.08.19