Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2004.08a
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- Pages.228-228
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- 2004
Etching characteristics of Ta and TaN using Cl2/Ar inductively coupled plasma
- Shin, M.H. (Dept. of Materials Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Na, S.W. (Dept. of Materials Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Lee, N.E. (School of Materials science and Engineering, Hanyang University) ;
- Ahn, J.H. (School of Materials science and Engineering, Hanyang University)
- Published : 2004.08.19
Abstract
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