Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2004.08a
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- Pages.226-226
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- 2004
Etching characteristics of ZnO thin films using inductively coupled $BCl_3$ /Ar and $Cl_2$ /Ar plasma
- Na, S.W. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Shin, M.H. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Chung, Y.M. (Dept. of Advanced Materials Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Han, J.G. (Dept. of Advanced Materials Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Jeung, S.H. (Dept. of Chemistry and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Boo, J.H. (Dept. of Chemistry and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Lee, N.E. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University)
- Published : 2004.08.19
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