한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2004년도 제27회 학술발표회 초록집
- /
- Pages.226-226
- /
- 2004
Etching characteristics of ZnO thin films using inductively coupled $BCl_3$ /Ar and $Cl_2$ /Ar plasma
- Na, S.W. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Shin, M.H. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Chung, Y.M. (Dept. of Advanced Materials Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Han, J.G. (Dept. of Advanced Materials Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Jeung, S.H. (Dept. of Chemistry and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Boo, J.H. (Dept. of Chemistry and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
- Lee, N.E. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University)
- 발행 : 2004.08.19